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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 21, Number 3
BKCSDE 21(3)
March 20, 2000 

 
Title
Photopolymerization of Methyl Methacrylate with 1,4-C6H4(SiH3-xMex)2
Author
Hee-Gweon Woo*, Eun-Mi Oh, Jong-Hak Park, Bo-Hye Kim, Young-Nam Kim, Chan-Ho Yoon, Heui-Suk Ham*
Keywords
Abstract
The bulk photopolymerization of methyl methacrylate (MMA) with bis(silane)s such as 1,4-C6H4(SiH3)2 (1) and 1,4-C6H4(SiH2Me)2 (2) was performed to produce poly(MMA)s possessing the corresponding bis(silyl) moiety as an end group. For the bis(silane)s, while the polymerization yields and the polymer molecular weights decreased, the TGA residue yields and the relative intensities of Si-H IR stretching bands increased as the relative bis(silane) concentration over MMA increased. The polymerization yield, polymer molecular weight, and TGA residue yield of MMA with 1 were found to be higher than those with 2. The bis(silane)s appears to influence significantly upon the photopolymerization of MMA as both chain initiation and chain transfer agents.
Page
291 - 294
Full Text
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