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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 25, Number 2
BKCSDE 25(2)
February 20, 2004 

Spectroscopic Studies on Electroless Deposition of Copper on Hydrogen-Terminated Si(111) Surface in NH4F Solution Containing Cu(II) Ions
In-Churl Lee, Sang-Eun Bae, Moon-Bong Song, Jong-Soon Lee, Se-Hwan Paek, Chi-Woo J. Lee*
Silicon, Copper, Ammonium fluoride, ATR, STM
The electroless deposition of copper on the hydrogen-terminated Si(111) surface was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy, scanning tunneling microscopy (STM), and energy-dispersive spectroscopy (EDS). The hydrogen-terminated Si(111) surface prepared was stable under air atmosphere for a day or more. It was found from ATR-FTIR that two bands centered at 2000 and 2260 cm.1 appeared after the H-Si(111) surface was immersed in 40% NH4F solution containing 10 mM Cu2+. On the other hand, STM image included the copper islands with a height of 5 nm and a diameter of 10-20 nm. The EDS data displayed the presence of copper, silicon and oxygen species. The results were rationalized in terms of the redox reaction of surface Si atoms and Cu2+ ions in solutions, which are changed into Si(OH)x(F)y containing SiF6 2. ions and neutral copper islands.
167 - 171
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