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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 27, Number 2
BKCSDE 27(2)
February 20, 2006 

Thermal Decomposition of Tetrakis(ethylmethylamido) Titanium for Chemical Vapor Deposition of Titanium Nitride
Seong Jae Kim, Bo-Hye Kim, Hee-Gweon Woo, Su-Kyung Kim, Do-Heyoung Kim*
Chemical vapor deposition (CVD), Tetrakis(ethylmethylamido) titanium (TEMAT), Titanium nitride, Film, Thermal decomposition
The thermal decomposition of tetrakis(ethylmethylamido) titanium (TEMAT) has been investigated in Ar and H2 gas atmospheres at gas temperatures of 100-400 oC by using Fourier Transform infrared spectroscopy (FTIR) as a fundamental study for the chemical vapor deposition (CVD) of titanium nitride (TiN) thin film. The activation energy for the decomposition of TEMAT was estimated to be 10.92 kcal/mol and the reaction order was determined to be the first order. The decomposition behavior of TEMAT was affected by ambient gases. TEMAT was decomposed into the intermediate forms of imine (C=N) compounds in Ar and H2 atmosphere, but additional nitrile (RC≡N) compound was observed only in H2 atmosphere. The decomposition rate of TEMAT under H2 atmosphere was slower than that in Ar atmosphere, which resulted in the extension of the regime of the surface reaction control in the CVD TiN process.
219 - 223
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