Current time in Korea 06:26 Oct 21 (Sat) Year 2017 KCS KCS Publications
KCS Publications
My Journal Log In Register
HOME > Search > Browsing(BKCS) > Archives

Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 28, Number 3
BKCSDE 28(3)
March 20, 2007 

 
Title
Reaction of NO on Vanadium Oxide Surfaces: Observation of the NO Dimer Formation
Author
Hyun Suck Jeong, Chang Min Kim*
Keywords
VO, NO, NO dimer, XPS, NEXAFS
Abstract
The adsorption and surface reactions of NO on a VO/V(110) surface have been investigated using X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure, and temperature programmed desorption (TPD) technique. NO is molecularly adsorbed on VO/V(110) at 80 K. As the surface coverage of NO increases, the NO dimer is formed on the surface at 80 K. Both NO and (NO)2 are adsorbed on the surface with the N-O bond perpendicular to the surface. (NO)2 decomposes at ~100 K and the reaction product is desorbed as N2O. Decomposition of NO takes place when the surface temperature is higher than 273 K.
Page
413 - 416
Full Text
PDF