Current time in Korea 07:13 Oct 24 (Tue) Year 2017 KCS KCS Publications
KCS Publications
My Journal Log In Register
HOME > Search > Browsing(BKCS) > Archives

Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 29, Number 9
BKCSDE 29(9)
September 20, 2008 

Synthesis and Characterizations of Positive-Working Photosensitive Polyimides Having 4,5-Dimethoxy-o-Nitrobenzyl Side Group
Sun Ryu, Jong Hoon Kim, Seung Hee Lee, Myong Hoon Lee*
Photosensitive, Polyimides, Positive-working, Photoresist, o-Nitrobenzyl
To synthesize a new positive-working photosensitive polyimide, alkali-soluble polyimide containing carboxylic acid side group was synthesized, and parts of its carboxylic acid groups were esterified with 4,5- dimethoxy-2-nitrobenzyl bromide. The chemical structure of the resulting polymer was characterized by 1HNMR and FT-IR spectroscopies. The substitution ratio of photosensitive groups was estimated by 1H-NMR integration values, and the thermal properties were examined by differential scanning calorimetry and thermogravimetric analyses. Upon UV irradiaition, 4,5-dimethoxy-2-nitrobenzyl moiety underwent the photodegradation with generation of carboxylic acid side groups as evidenced by UV/vis spectroscopy. As a result, the polymer became soluble in alkaline developer, and a micron-sized positive pattern was successfully fabricated from the synthesized polymer.
1689 - 1694
Full Text